<?xml version="1.0" encoding="UTF-8"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-10-18T23:15:17Z</responseDate><request verb="GetRecord" identifier="oai:ebyu-rdlopen.rawdatalibrary.net:ebyu/14928" metadataPrefix="oai_dc">https://ebyu-rdlopen.rawdatalibrary.net/oai/request</request><GetRecord><record><header><identifier>oai:ebyu-rdlopen.rawdatalibrary.net:ebyu/14928</identifier><datestamp>2026-10-18T20:29:43Z</datestamp><setSpec>openaire</setSpec><setSpec>driver</setSpec><setSpec>com_ebyu_10000</setSpec><setSpec>col_ebyu_10001</setSpec></header><metadata><oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><dc:title>NH3 sensing properties of nanostructure ZnO thin film prepared by silar method</dc:title><dc:creator>Çorlu, Tugba</dc:creator><dc:creator>Karaduman, Irmak</dc:creator><dc:creator>Yildirim, Memet Ali</dc:creator><dc:creator>Ates, Aytunç</dc:creator><dc:creator>Acar, Selim</dc:creator><dc:subject>Ammonia</dc:subject><dc:subject>Gas sensor</dc:subject><dc:subject>SILAR method</dc:subject><dc:subject>Chemical sensors</dc:subject><dc:subject>Film preparation</dc:subject><dc:subject>Gas detectors</dc:subject><dc:subject>Metallic films</dc:subject><dc:subject>Nanostructures</dc:subject><dc:subject>Optical films</dc:subject><dc:subject>Scanning electron microscopy</dc:subject><dc:subject>Temperature</dc:subject><dc:subject>Zinc oxide</dc:subject><dc:subject>Gas sensing characteristics</dc:subject><dc:subject>Morphological characterization</dc:subject><dc:subject>Nanostructured ZnO</dc:subject><dc:subject>Operating temperature</dc:subject><dc:subject>Sensing characteristics</dc:subject><dc:subject>Successive ionic layer adsorption and reactions</dc:subject><dc:subject>X ray diffractometers</dc:subject><dc:subject>Thin films</dc:subject><dc:description>Ammonia (NH3) sensing characteristics of nanostructure ZnO thin film prepared by Successive Ionic Layer Adsorption and Reaction (SILAR) method are discussed in this paper. The structural and morphological characterizations of the film are performed by X-ray diffractometer (XRD) and Scanning Electron Microscope (SEM). The gas sensing characteristics have been studied by exposing the film to various concentrations of NH3 at different operating temperatures within the range of 37-77°C. The nanostructured ZnO thin film has exhibited maximum gas response to 100 ppm NH3 gas exposure at 77°C operating temperature. © 2017 Old City Publishing, Inc.</dc:description><dc:publisher>Old City Publishing</dc:publisher><dc:date>2017</dc:date><dc:type>Conference Object</dc:type><dc:identifier>https://rdlopen.rawdatalibrary.net/r/ebyu/14928</dc:identifier><dc:identifier>0018-1544</dc:identifier><dc:language>en</dc:language><dc:relation>High Temperatures - High Pressures</dc:relation><dc:rights>info:eu-repo/semantics/openAccess</dc:rights><dc:type>info:eu-repo/semantics/conferenceObject</dc:type><dc:identifier>https://ebyu-rdlopen.rawdatalibrary.net/tr/items/ebyu/14928</dc:identifier></oai_dc:dc></metadata></record></GetRecord></OAI-PMH>