Fabrication and characterization of Au/n-type InP Schottky barrier diode with monolayer graphene interlayer

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Özet

Au/graphene/n-InP Schottky barrier diode (SBD) was fabricated by the use of spray pyrolysis technique with a monolayer graphene interlayer, and the temperature dependent characteristics was performed in a wide temperature range from 60 to 300 K with steps. The Au/GR/n-InP SBD exhibited excellent rectifying behavior however barrier height (Φb0) of the device increased with increasing temperature while ideality factor (n) and series resistance (R s) decreased. The strong temperature dependency of SBH and the deviation from theoretical value of Richardson constant clarified by considering a Gaussian distribution model of the SBH which was caused by the BH inhomogeneities. The mean BH φof 0.94 and 0.59 eV was estimated with the standard deviation of 0.011 and 0.004 eV attributed to the presence of a double GD of SBD. The modified Richardson plots gave mean BH value of 0.98 and 0.70 eV and the Richardson constant values of 8.10, 13,38 A K-2 cm-2 was very close to its theoretical value of 9.4 A K-2 cm-2. These results yields that carrier transport mechanism of Au/GR/n-InP SBD can be clarified by Thermionic-emission-diffusion (TED) mechanism with a double Gaussian distribution of the SBHs. In addition, the I-V characteristics of SBD under dark and light ambiance indicates that Au/graphene/n-InP is strongly dependent on the light effect. Thus, we can conclude that graphene/n-InP device is a potential candidate for photovoltaic systems. Moreover, the UV-vis spectroscopy of the graphene film exhibit a strong absorption as A = 9.45% compared to the literature, that is, Au/GR/n-InP SBD grown by spray pyrolysis has excellent optical properties for optoelectronic applications. © 2020 IOP Publishing Ltd.

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RDL Kalıcı Bağlantı (PID)
https://rdlopen.rawdatalibrary.net/r/ebyu/13923Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1088/1361-6641/ab6bb4Yayıncı resmi DOI adresi
Tam Kayıt
AlanDeğerDil
dc.contributor.authorÇatır, Fulya Esra Cimilli
dc.date.accessioned2026-10-18T20:28:43.438766886Z
dc.date.available2026-10-18T20:28:43.438766886Z
dc.date.issued2020
dc.description.abstractAu/graphene/n-InP Schottky barrier diode (SBD) was fabricated by the use of spray pyrolysis technique with a monolayer graphene interlayer, and the temperature dependent characteristics was performed in a wide temperature range from 60 to 300 K with steps. The Au/GR/n-InP SBD exhibited excellent rectifying behavior however barrier height (Φb0) of the device increased with increasing temperature while ideality factor (n) and series resistance (R s) decreased. The strong temperature dependency of SBH and the deviation from theoretical value of Richardson constant clarified by considering a Gaussian distribution model of the SBH which was caused by the BH inhomogeneities. The mean BH φof 0.94 and 0.59 eV was estimated with the standard deviation of 0.011 and 0.004 eV attributed to the presence of a double GD of SBD. The modified Richardson plots gave mean BH value of 0.98 and 0.70 eV and the Richardson constant values of 8.10, 13,38 A K-2 cm-2 was very close to its theoretical value of 9.4 A K-2 cm-2. These results yields that carrier transport mechanism of Au/GR/n-InP SBD can be clarified by Thermionic-emission-diffusion (TED) mechanism with a double Gaussian distribution of the SBHs. In addition, the I-V characteristics of SBD under dark and light ambiance indicates that Au/graphene/n-InP is strongly dependent on the light effect. Thus, we can conclude that graphene/n-InP device is a potential candidate for photovoltaic systems. Moreover, the UV-vis spectroscopy of the graphene film exhibit a strong absorption as A = 9.45% compared to the literature, that is, Au/GR/n-InP SBD grown by spray pyrolysis has excellent optical properties for optoelectronic applications. © 2020 IOP Publishing Ltd.
dc.identifier.doi10.1088/1361-6641/ab6bb4
dc.identifier.eissn1361-6641
dc.identifier.issn0268-1242
dc.identifier.issue3
dc.identifier.scopus2-s2.0-85082308167
dc.identifier.startpage035023
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/13923
dc.identifier.volume35
dc.identifier.wosWOS:000537720200001
dc.language.isoen
dc.publisherIOP Publishing Ltd
dc.relation.ispartofSemiconductor Science and Technology
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subject2D materials
dc.subjectabsorbance
dc.subjectGraphene
dc.subjectInP
dc.subjectSchottky barrier diode
dc.subjectDiodes
dc.subjectElectric resistance
dc.subjectFabrication
dc.subjectGaussian distribution
dc.subjectGold metallography
dc.subjectIII-V semiconductors
dc.subjectIndium phosphide
dc.subjectMonolayers
dc.subjectOptical properties
dc.subjectPhotovoltaic cells
dc.subjectSchottky barrier diodes
dc.subjectSemiconducting indium phosphide
dc.subjectSemiconductor metal boundaries
dc.subjectSpray pyrolysis
dc.subjectThermionic emission
dc.subjectUltraviolet visible spectroscopy
dc.subjectAbsorbances
dc.subjectCarrier transport mechanisms
dc.subjectFabrication and characterizations
dc.subjectGaussian distribution model
dc.subjectOptoelectronic applications
dc.subjectSchottky Barrier Diode(SBD)
dc.subjectSpray-pyrolysis techniques
dc.subjectTemperature dependencies
dc.subjectGold compounds
dc.titleFabrication and characterization of Au/n-type InP Schottky barrier diode with monolayer graphene interlayer
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus7
rdl.citation.wos7
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)