Effect of thickness on the structural and optical properties of CuO thin films grown by successive ionic layer adsorption and reaction

ArticleAçık Erişim

Özet

CuO thin films were synthesised on glass substrates at room temperature using successive ionic layer adsorption and reaction (SILAR) method. The effect of film thickness on characteristic parameters such as the structural, morphological and optical properties of the films was investigated. The X-ray diffraction (XRD) and scanning electron microscopy (SEM) studies showed that all of the films exhibited polycrystalline structure with monoclinic phases and covered the glass substrates well. The crystalline and morphology of the films improved with increasing film thickness. The optical band gap decreased from 2.03 to 1.79 eV depending on the film thickness. The refractive index (n), electron effective mass (me∗/mo) and static and frequency dielectric constants (ϵo, ϵ∞) were determined using the energy band gap values. © 2015 Elsevier B.V. All rights reserved.

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RDL Kalıcı Bağlantı (PID)
https://rdlopen.rawdatalibrary.net/r/ebyu/15451Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1016/j.tsf.2015.10.003Yayıncı resmi DOI adresi
Tam Kayıt
AlanDeğerDil
dc.contributor.authorAkaltun, Yunus
dc.date.accessioned2026-10-18T20:30:17.532057418Z
dc.date.available2026-10-18T20:30:17.532057418Z
dc.date.issued2015
dc.description.abstractCuO thin films were synthesised on glass substrates at room temperature using successive ionic layer adsorption and reaction (SILAR) method. The effect of film thickness on characteristic parameters such as the structural, morphological and optical properties of the films was investigated. The X-ray diffraction (XRD) and scanning electron microscopy (SEM) studies showed that all of the films exhibited polycrystalline structure with monoclinic phases and covered the glass substrates well. The crystalline and morphology of the films improved with increasing film thickness. The optical band gap decreased from 2.03 to 1.79 eV depending on the film thickness. The refractive index (n), electron effective mass (me∗/mo) and static and frequency dielectric constants (ϵo, ϵ∞) were determined using the energy band gap values. © 2015 Elsevier B.V. All rights reserved.
dc.description.sponsorshipWe would like to acknowledge the financial support given by the Erzincan University Research Foundation , Project No: FEN-A-150615-0146 .
dc.identifier.doi10.1016/j.tsf.2015.10.003
dc.identifier.endpage34
dc.identifier.issn0040-6090
dc.identifier.scopus2-s2.0-84964329884
dc.identifier.startpage30
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/15451
dc.identifier.volume594
dc.identifier.wosWOS:000365046500006
dc.language.isoen
dc.publisherElsevier B.V.
dc.relation.ispartofThin Solid Films
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectDielectric properties
dc.subjectOptical properties
dc.subjectOxides
dc.subjectSemiconductors
dc.subjectThin films
dc.subjectCopper oxides
dc.subjectDielectric properties of solids
dc.subjectEnergy gap
dc.subjectFilm thickness
dc.subjectGlass
dc.subjectRefractive index
dc.subjectScanning electron microscopy
dc.subjectSemiconductor materials
dc.subjectSubstrates
dc.subjectX ray diffraction
dc.subjectCuO thin films
dc.subjectElectron effective mass
dc.subjectEnergy bandgaps
dc.subjectGlass substrates
dc.subjectMonoclinic phasis
dc.subjectPolycrystalline structure
dc.subjectStructural and optical properties
dc.subjectSuccessive ionic layer adsorption and reactions
dc.subjectOptical films
dc.titleEffect of thickness on the structural and optical properties of CuO thin films grown by successive ionic layer adsorption and reaction
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus86
rdl.citation.wos78
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)