Annealing and light effect on optical and electrical properties of ZnS thin films grown with the SILAR method

ArticleAçık Erişim

Özet

Zinc sulphide (ZnS) thin films were grown on glass substrates by the Successive Ionic Layer Adsorption and Reaction (SILAR) technique at room temperature and ambient pressure. Surface morphologies of grown films were characterized using scanning electron microscopy (SEM). The crystal structure and crystal size of the thin films were characterized by the X-ray diffraction (XRD) method and found that the films exhibit polycrystalline characterization. The optical absorption measurements were done as a function of the temperature at 10-320 K temperature range. Using absorption measurements, the band gap energies were calculated at 10 and 320 K, as 3.83 and 3.72 eV, respectively. The annealing temperature effect on optical band gap and the light effect on the electrical properties of ZnS thin films were investigated and it was found that the current increased with increasing light intensity. The annealed films were found have more resistance than the as-grown film. © 2008 Elsevier Ltd. All rights reserved.

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RDL Kalıcı Bağlantı (PID)
https://rdlopen.rawdatalibrary.net/r/ebyu/16129Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1016/j.mssp.2008.04.003Yayıncı resmi DOI adresi
Tam Kayıt
AlanDeğerDil
dc.contributor.authorAtes, Aytunc
dc.contributor.authorYildirim, M. Ali
dc.contributor.authorKundakci, Mutlu
dc.contributor.authorAstam, Aykut
dc.date.accessioned2026-10-18T20:30:56.844373807Z
dc.date.available2026-10-18T20:30:56.844373807Z
dc.date.issued2007
dc.description.abstractZinc sulphide (ZnS) thin films were grown on glass substrates by the Successive Ionic Layer Adsorption and Reaction (SILAR) technique at room temperature and ambient pressure. Surface morphologies of grown films were characterized using scanning electron microscopy (SEM). The crystal structure and crystal size of the thin films were characterized by the X-ray diffraction (XRD) method and found that the films exhibit polycrystalline characterization. The optical absorption measurements were done as a function of the temperature at 10-320 K temperature range. Using absorption measurements, the band gap energies were calculated at 10 and 320 K, as 3.83 and 3.72 eV, respectively. The annealing temperature effect on optical band gap and the light effect on the electrical properties of ZnS thin films were investigated and it was found that the current increased with increasing light intensity. The annealed films were found have more resistance than the as-grown film. © 2008 Elsevier Ltd. All rights reserved.
dc.description.sponsorshipWe would like to acknowledge the financial support given by the TUBİTAK Foundation, Project no. 107T097.
dc.identifier.doi10.1016/j.mssp.2008.04.003
dc.identifier.eissn1873-4081
dc.identifier.endpage286
dc.identifier.issn1369-8001
dc.identifier.issue6
dc.identifier.scopus2-s2.0-44749091487
dc.identifier.startpage281
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/16129
dc.identifier.volume10
dc.identifier.wosWOS:000257894800010
dc.language.isoen
dc.publisherELSEVIER SCI LTD
dc.relation.ispartofMaterials Science in Semiconductor Processing
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectLight and annealing effect
dc.subjectOptical properties
dc.subjectSILAR
dc.subjectZnS
dc.subjectAnnealing
dc.subjectFilm growth
dc.subjectThermal effects
dc.subjectZinc sulfide
dc.subjectAnnealing temperature
dc.subjectRoom temperature
dc.subjectThin films
dc.titleAnnealing and light effect on optical and electrical properties of ZnS thin films grown with the SILAR method
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus77
rdl.citation.wos70
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)