Fabrication of CdO thin films with SILAR: Influence of annealing temperature on physical properties

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Özet

Cadmium oxide (CdO) thin film was grown on a glass substrate at room temperature using the Successive ionic layer adsorption and reaction (SILAR) method. The grown thin films were annealed at 3500C and 4000C for 30 min. Structural and optical properties of CdO thin films after annealing were examined. Analyzes were made with X-ray diffractometer (XRD) and Scanning electron microscope-Energy dispersive X-ray spectroscopy (SEM-EDAX) devices for structural properties, and UV–Vis devices for optical properties. The XRD peak intensities of CdO thin films exposed to annealing temperature increased and the crystal structure improved. The bandgap energy range decreased from 2.48 eV to 2.37 eV with the effect of annealing temperature. © The Author(s), under exclusive licence to Springer Nature B.V. 2025.

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https://rdlopen.rawdatalibrary.net/r/ebyu/10968Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1007/s11051-025-06274-6Yayıncı resmi DOI adresi
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AlanDeğerDil
dc.contributor.authorTaşdemirci, Tuba Çayir
dc.date.accessioned2026-10-18T20:26:04.817158927Z
dc.date.available2026-10-18T20:26:04.817158927Z
dc.date.issued2025
dc.description.abstractCadmium oxide (CdO) thin film was grown on a glass substrate at room temperature using the Successive ionic layer adsorption and reaction (SILAR) method. The grown thin films were annealed at 3500C and 4000C for 30 min. Structural and optical properties of CdO thin films after annealing were examined. Analyzes were made with X-ray diffractometer (XRD) and Scanning electron microscope-Energy dispersive X-ray spectroscopy (SEM-EDAX) devices for structural properties, and UV–Vis devices for optical properties. The XRD peak intensities of CdO thin films exposed to annealing temperature increased and the crystal structure improved. The bandgap energy range decreased from 2.48 eV to 2.37 eV with the effect of annealing temperature. © The Author(s), under exclusive licence to Springer Nature B.V. 2025.
dc.identifier.doi10.1007/s11051-025-06274-6
dc.identifier.eissn1572-896X
dc.identifier.issn1388-0764
dc.identifier.issue4
dc.identifier.scopus2-s2.0-105000457170
dc.identifier.startpage82
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/10968
dc.identifier.volume27
dc.identifier.wosWOS:001446356100001
dc.language.isoen
dc.publisherSpringer Science and Business Media B.V.
dc.relation.ispartofJournal of Nanoparticle Research
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectAnnealing Temperature
dc.subjectCdO
dc.subjectSILAR
dc.subjectThin film
dc.subjectEnergy dispersive spectroscopy
dc.subjectOptical depth
dc.subjectOptical films
dc.subjectOxide films
dc.subjectX ray diffraction analysis
dc.subjectcadmium oxide
dc.subjectAdsorption method
dc.subjectAnnealing temperatures
dc.subjectGlass substrates
dc.subjectOxide thin films
dc.subjectProperty
dc.subjectReaction method
dc.subjectSuccessive ionic layer adsorption and reactions
dc.subjectThin-films
dc.subjectX ray diffractometers
dc.subjectArticle
dc.subjectcrystal structure
dc.subjectcrystallography
dc.subjectenergy dispersive X ray spectroscopy
dc.subjectparticle size
dc.subjectroom temperature
dc.subjectsuccessive ionic layer adsorption and reaction
dc.subjectsurface property
dc.subjecttemperature
dc.subjectultraviolet visible spectroscopy
dc.subjectAnnealing
dc.titleFabrication of CdO thin films with SILAR: Influence of annealing temperature on physical properties
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus5
rdl.citation.wos5
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)