Electrochemically structured tantalum surfaces via anodization for core-shell nanostructures: Optimization and characterization of Zn-ZnO nanoparticle deposition using magnetron sputtering

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This study explores the electrochemical anodization of tantalum surfaces to create nanostructured substrates for the deposition of Zn-ZnO nanoparticles (NPs) through magnetron sputtering. The anodization process, conducted at different potentials (25 V and 50 V), resulted in tantalum surfaces with distinct dimple structures. The formation of these nano-level dimples is attributed to the dynamic equilibrium between the continuous formation and dissolution of the anodic TaOx layer. The dimple diameter is observed to increase with applied potential, correlating with the dissolution rate of the anodic oxide. The NP deposition parameters were studied in two steps. First, the effect of the deposition conditions on the nanoparticle size and distribution was evaluated and optimized on silicon substrates. Second, the conditions that resulted in the optimum size and distribution of the nanoparticles were utilized in tantalum substrates and evaluated to which extent these conditions were reproduced onto the anodized Ta substrate. Comparisons of Zn-ZnO nanoparticle depositions on silicon and tantalum substrates reveal similar island growth trends, with differences in nanoparticle size and distribution attributed to substrate properties. Further investigation involves anodized tantalum substrates with varying dimple sizes, and deposition conditions are adjusted with bias voltage, pressure, and deposition time to control nanoparticle characteristics. Characterization of the Zn-ZnO nanoparticles deposited on anodized tantalum surfaces is performed using scanning electron microscopy, high-angle annular dark-field scanning transmission electron microscopy, and energy-dispersive x-ray spectroscopy. The resulting core-shell structures are confirmed through structural analysis, revealing a core of hexagonal close-packed Zn and a shell of ZnO. The study demonstrates the influence of substrate properties and deposition conditions on the morphology and composition of Zn-ZnO nanoparticles, providing insights for applications in nanoelectronics and catalysis. © 2024 Author(s).

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https://rdlopen.rawdatalibrary.net/r/ebyu/11763Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1116/6.0003266Yayıncı resmi DOI adresi
Tam Kayıt
AlanDeğerDil
dc.contributor.authorKara, Levent
dc.contributor.authorCalderon, Sebastian
dc.contributor.authorCarvalho, Sandra
dc.date.accessioned2026-10-18T20:26:45.866106257Z
dc.date.available2026-10-18T20:26:45.866106257Z
dc.date.issued2024
dc.description.abstractThis study explores the electrochemical anodization of tantalum surfaces to create nanostructured substrates for the deposition of Zn-ZnO nanoparticles (NPs) through magnetron sputtering. The anodization process, conducted at different potentials (25 V and 50 V), resulted in tantalum surfaces with distinct dimple structures. The formation of these nano-level dimples is attributed to the dynamic equilibrium between the continuous formation and dissolution of the anodic TaOx layer. The dimple diameter is observed to increase with applied potential, correlating with the dissolution rate of the anodic oxide. The NP deposition parameters were studied in two steps. First, the effect of the deposition conditions on the nanoparticle size and distribution was evaluated and optimized on silicon substrates. Second, the conditions that resulted in the optimum size and distribution of the nanoparticles were utilized in tantalum substrates and evaluated to which extent these conditions were reproduced onto the anodized Ta substrate. Comparisons of Zn-ZnO nanoparticle depositions on silicon and tantalum substrates reveal similar island growth trends, with differences in nanoparticle size and distribution attributed to substrate properties. Further investigation involves anodized tantalum substrates with varying dimple sizes, and deposition conditions are adjusted with bias voltage, pressure, and deposition time to control nanoparticle characteristics. Characterization of the Zn-ZnO nanoparticles deposited on anodized tantalum surfaces is performed using scanning electron microscopy, high-angle annular dark-field scanning transmission electron microscopy, and energy-dispersive x-ray spectroscopy. The resulting core-shell structures are confirmed through structural analysis, revealing a core of hexagonal close-packed Zn and a shell of ZnO. The study demonstrates the influence of substrate properties and deposition conditions on the morphology and composition of Zn-ZnO nanoparticles, providing insights for applications in nanoelectronics and catalysis. © 2024 Author(s).
dc.description.sponsorshipThis research was funded by FEDER funds through the program COMPETE—Programa Operacional Factores de Competitividade, and by national funds through the Portuguese Foundation for Science and Technology (FCT), under Project No. UIDB/00285/2020 and the program ARISE with Reference No. LA/P/0112/2020. Also, This research is financed by PRR—Recovery and Resilience Plan and by the Next Generation EU Funds, following NOTICE No. 02/C05-i01/2022, Component 5—Capitalization and Business Innovation—Mobilizing Agendas for Business Innovation under the AM2R project “Mobilizing Agenda for business innovation in the Two Wheels sector” (Reference No. 7253).
dc.identifier.doi10.1116/6.0003266
dc.identifier.eissn1520-8559
dc.identifier.issn0734-2101
dc.identifier.issue3
dc.identifier.scopus2-s2.0-85187224313
dc.identifier.startpage033101
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/11763
dc.identifier.volume42
dc.identifier.wosWOS:001180974700002
dc.language.isoen
dc.publisherAVS Science and Technology Society
dc.relation.ispartofJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectAnodic oxidation
dc.subjectDissolution
dc.subjectEnergy dispersive spectroscopy
dc.subjectHigh resolution transmission electron microscopy
dc.subjectMagnetron sputtering
dc.subjectMetal nanoparticles
dc.subjectMorphology
dc.subjectScanning electron microscopy
dc.subjectShells (structures)
dc.subjectSubstrates
dc.subjectTantalum
dc.subjectZnO nanoparticles
dc.subjectAnodizations
dc.subjectCore shell nano structures
dc.subjectCore-shell nanostructures
dc.subjectDeposition conditions
dc.subjectMagnetron-sputtering
dc.subjectNanoparticle deposition
dc.subjectNanoparticle sizes
dc.subjectSubstrate properties
dc.subjectII-VI semiconductors
dc.titleElectrochemically structured tantalum surfaces via anodization for core-shell nanostructures: Optimization and characterization of Zn-ZnO nanoparticle deposition using magnetron sputtering
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus1
rdl.citation.wos1
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)