Erzincan Binali Yıldırım ÜniversitesiErzincan Binali Yıldırım ÜniversitesiAçık Erişim Arşivi · RDL Open

NH3 sensing properties of nanostructure ZnO thin film prepared by silar method

Conference ObjectAçık Erişim

Özet

Ammonia (NH3) sensing characteristics of nanostructure ZnO thin film prepared by Successive Ionic Layer Adsorption and Reaction (SILAR) method are discussed in this paper. The structural and morphological characterizations of the film are performed by X-ray diffractometer (XRD) and Scanning Electron Microscope (SEM). The gas sensing characteristics have been studied by exposing the film to various concentrations of NH3 at different operating temperatures within the range of 37-77°C. The nanostructured ZnO thin film has exhibited maximum gas response to 100 ppm NH3 gas exposure at 77°C operating temperature. © 2017 Old City Publishing, Inc.

Anahtar Kelimeler

AmmoniaGas sensorSILAR methodChemical sensorsFilm preparationGas detectorsMetallic filmsNanostructuresOptical filmsScanning electron microscopyTemperatureZinc oxideGas sensing characteristicsMorphological characterizationNanostructured ZnOOperating temperatureSensing characteristicsSuccessive ionic layer adsorption and reactionsX ray diffractometersThin films
RDL Kalıcı Bağlantı (PID)
https://rdlopen.rawdatalibrary.net/r/ebyu/14928Resmi atıflarda kullanılan kalıcı adres
Tam Kayıt
AlanDeğerDil
dc.contributor.authorÇorlu, Tugba
dc.contributor.authorKaraduman, Irmak
dc.contributor.authorYildirim, Memet Ali
dc.contributor.authorAtes, Aytunç
dc.contributor.authorAcar, Selim
dc.date.accessioned2026-10-18T20:29:43.280712303Z
dc.date.available2026-10-18T20:29:43.280712303Z
dc.date.issued2017
dc.description.abstractAmmonia (NH3) sensing characteristics of nanostructure ZnO thin film prepared by Successive Ionic Layer Adsorption and Reaction (SILAR) method are discussed in this paper. The structural and morphological characterizations of the film are performed by X-ray diffractometer (XRD) and Scanning Electron Microscope (SEM). The gas sensing characteristics have been studied by exposing the film to various concentrations of NH3 at different operating temperatures within the range of 37-77°C. The nanostructured ZnO thin film has exhibited maximum gas response to 100 ppm NH3 gas exposure at 77°C operating temperature. © 2017 Old City Publishing, Inc.
dc.identifier.endpage165
dc.identifier.issn0018-1544
dc.identifier.issue2
dc.identifier.scopus2-s2.0-85016606362
dc.identifier.startpage155
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/14928
dc.identifier.volume46
dc.language.isoen
dc.publisherOld City Publishing
dc.relation.ispartofHigh Temperatures - High Pressures
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectAmmonia
dc.subjectGas sensor
dc.subjectSILAR method
dc.subjectChemical sensors
dc.subjectFilm preparation
dc.subjectGas detectors
dc.subjectMetallic films
dc.subjectNanostructures
dc.subjectOptical films
dc.subjectScanning electron microscopy
dc.subjectTemperature
dc.subjectZinc oxide
dc.subjectGas sensing characteristics
dc.subjectMorphological characterization
dc.subjectNanostructured ZnO
dc.subjectOperating temperature
dc.subjectSensing characteristics
dc.subjectSuccessive ionic layer adsorption and reactions
dc.subjectX ray diffractometers
dc.subjectThin films
dc.titleNH3 sensing properties of nanostructure ZnO thin film prepared by silar method
dc.typeConference Object
dspace.entity.typePublication
rdl.citation.scopus1
rdl.source.indexSCOPUS