Temperature dependent current-voltage characteristics of the Cd/CdO/n-Si/Au-Sb structure

ArticleAçık Erişim

Özet

In this study, this is the first time, it has been employed Successive Ionic Layer Adsorption and Reaction (SILAR) method in order to prepare Cd/CdO/n-Si/Au-Sb sandwich structure. The sample temperature effect on the current-voltage (I-V) characteristics of Cd/CdO/n-Si/Au-Sb structure has been investigated in a wide temperature range by steps of 20 K. The parameters such as barrier height, ideality factor and series resistance of this structure have been calculated from the forward bias I-V characteristics as a function of sample temperature. With a decreasing temperature, a decreasing in the apparent barrier height (Φb0), an increasing in the ideality factor (n) and a nonlinearity in the activation energy plot have been seen. The experimental values of barrier height and ideality factor for this device have been calculated as 0.871 eV and 1.787 at 300 K and 0.436 eV and 2.221 at 80 K, respectively. These abnormal behaviors can be explain by the barrier inhomogeneities at the metal-semiconductor (M-S) interface. From the temperature dependent I-V characteristics of the Cd/CdO/n-Si/Au-Sb sandwich structure, over(Φ, ̄)b 0 and A* are calculated as 0.790 and 1.160 eV, and 153.90 and 188.42 A/cm2 K2, respectively, by using ln (I0 / T2) - q2 σs2 / 2 k2 T2 vs. 1/T plot for the two temperature regions. Deviation of experimental values of A* from known value for n-Si has been attributed to the spatial inhomogeneous barrier heights and potential fluctuations at the interface that consist of low and high barrier areas. © 2009 Elsevier B.V. All rights reserved.

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RDL Kalıcı Bağlantı (PID)
https://rdlopen.rawdatalibrary.net/r/ebyu/16156Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1016/j.cap.2009.07.011Yayıncı resmi DOI adresi
Tam Kayıt
AlanDeğerDil
dc.contributor.authorSaǧlam, M.
dc.contributor.authorAteş, A.
dc.contributor.authorYildirim, M.A.
dc.contributor.authorGüzeldir, B.
dc.contributor.authorAstam, A.
dc.date.accessioned2026-10-18T20:30:58.081705494Z
dc.date.available2026-10-18T20:30:58.081705494Z
dc.date.issued2010
dc.description.abstractIn this study, this is the first time, it has been employed Successive Ionic Layer Adsorption and Reaction (SILAR) method in order to prepare Cd/CdO/n-Si/Au-Sb sandwich structure. The sample temperature effect on the current-voltage (I-V) characteristics of Cd/CdO/n-Si/Au-Sb structure has been investigated in a wide temperature range by steps of 20 K. The parameters such as barrier height, ideality factor and series resistance of this structure have been calculated from the forward bias I-V characteristics as a function of sample temperature. With a decreasing temperature, a decreasing in the apparent barrier height (Φb0), an increasing in the ideality factor (n) and a nonlinearity in the activation energy plot have been seen. The experimental values of barrier height and ideality factor for this device have been calculated as 0.871 eV and 1.787 at 300 K and 0.436 eV and 2.221 at 80 K, respectively. These abnormal behaviors can be explain by the barrier inhomogeneities at the metal-semiconductor (M-S) interface. From the temperature dependent I-V characteristics of the Cd/CdO/n-Si/Au-Sb sandwich structure, over(Φ, ̄)b 0 and A* are calculated as 0.790 and 1.160 eV, and 153.90 and 188.42 A/cm2 K2, respectively, by using ln (I0 / T2) - q2 σs2 / 2 k2 T2 vs. 1/T plot for the two temperature regions. Deviation of experimental values of A* from known value for n-Si has been attributed to the spatial inhomogeneous barrier heights and potential fluctuations at the interface that consist of low and high barrier areas. © 2009 Elsevier B.V. All rights reserved.
dc.description.sponsorshipWe would also like to acknowledge the financial support given by the TUBİTAK Foundation, Project No: 108T500.
dc.identifier.doi10.1016/j.cap.2009.07.011
dc.identifier.endpage520
dc.identifier.issn1567-1739
dc.identifier.issue2
dc.identifier.scopus2-s2.0-70350728801
dc.identifier.startpage513
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/16156
dc.identifier.volume10
dc.identifier.wosWOS:000272279000028
dc.language.isoen
dc.publisherELSEVIER SCIENCE BV
dc.relation.ispartofCurrent Applied Physics
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectActivation energy
dc.subjectCdO
dc.subjectGaussian distribution
dc.subjectSandwich structure
dc.subjectSILAR method
dc.subjectThin film
dc.subjectAdsorption
dc.subjectCadmium compounds
dc.subjectSandwich structures
dc.subjectThermal effects
dc.subjectThin film devices
dc.subjectThin films
dc.subjectAbnormal behavior
dc.subjectBarrier heights
dc.subjectBarrier inhomogeneities
dc.subjectExperimental values
dc.subjectForward bias
dc.subjectIdeality factors
dc.subjectIV characteristics
dc.subjectNon-Linearity
dc.subjectPotential fluctuations
dc.subjectSample temperature
dc.subjectSeries resistances
dc.subjectSuccessive ionic layer adsorption and reactions
dc.subjectTemperature dependent
dc.subjectTemperature dependent I-V characteristics
dc.subjectTemperature range
dc.subjectTwo-temperature
dc.subjectCurrent voltage characteristics
dc.titleTemperature dependent current-voltage characteristics of the Cd/CdO/n-Si/Au-Sb structure
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus33
rdl.citation.wos34
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)