Complex electrical impedance and modulus characterizations of ZnO:Sn thin films in a wide temperature range

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Özet

In this study, pure zinc oxide (ZnO) and tin-doped zinc oxide (Zn1−xSnxO) thin films were synthesized using successive ionic layer adsorption and reaction (SILAR) method in 40 cycles with doping ratios x = 0.05, 0.10, 0.15, and 0.20. Subsequently, structural, optical, and electrical characteristics of all synthesized thin films were properly investigated by the appropriate techniques. For structural characterizations, X-ray diffraction (XRD) technique was employed, and the data demonstrated the appropriate hexagonal wurtzite structure of the synthesized thin films and predicted the decrease of crystallite size with Sn doping. Likewise, optical characterizations were carried out through ultraviolet–visible (UV–Vis) technique, and the data showed good transparency of ZnO thin film and confirmed the increase in transparency and bandgap upon Sn doping. Additionally, to probe the electrical aspects of the synthesized thin films, impedance, modulus, and conductivity analyses were carried out as a function of frequency in a wide temperature range (450–750 K). The results demonstrated the critical effect of temperature and Sn doping ratio in ZnO thin films. At high enough temperatures, inductive effects became evident in the low-frequency region of all the thin films. And at all temperatures, 5 wt%- and 10 wt%-doped films exhibited extreme responses in the investigated doping range, where the former and the latter showed, respectively, highest and lowest conductivity as well as lowest and highest possibility of grain effects in the film structure. This behavior was confirmed using two different analysis techniques with two separate data sets, (Z, θ) and (C, G). © 2021, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature.

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RDL Kalıcı Bağlantı (PID)
https://rdlopen.rawdatalibrary.net/r/ebyu/13185Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1007/s10854-021-05935-1Yayıncı resmi DOI adresi
Tam Kayıt
AlanDeğerDil
dc.contributor.authorEr, Irmak Karaduman
dc.contributor.authorÇağırtekin, Ali Orkun
dc.contributor.authorAjjaq, Ahmad
dc.contributor.authorYıldırım, Memet Ali
dc.contributor.authorAteş, Aytunç
dc.contributor.authorAcar, Selim
dc.date.accessioned2026-10-18T20:28:01.428952279Z
dc.date.available2026-10-18T20:28:01.428952279Z
dc.date.issued2021
dc.description.abstractIn this study, pure zinc oxide (ZnO) and tin-doped zinc oxide (Zn1−xSnxO) thin films were synthesized using successive ionic layer adsorption and reaction (SILAR) method in 40 cycles with doping ratios x = 0.05, 0.10, 0.15, and 0.20. Subsequently, structural, optical, and electrical characteristics of all synthesized thin films were properly investigated by the appropriate techniques. For structural characterizations, X-ray diffraction (XRD) technique was employed, and the data demonstrated the appropriate hexagonal wurtzite structure of the synthesized thin films and predicted the decrease of crystallite size with Sn doping. Likewise, optical characterizations were carried out through ultraviolet–visible (UV–Vis) technique, and the data showed good transparency of ZnO thin film and confirmed the increase in transparency and bandgap upon Sn doping. Additionally, to probe the electrical aspects of the synthesized thin films, impedance, modulus, and conductivity analyses were carried out as a function of frequency in a wide temperature range (450–750 K). The results demonstrated the critical effect of temperature and Sn doping ratio in ZnO thin films. At high enough temperatures, inductive effects became evident in the low-frequency region of all the thin films. And at all temperatures, 5 wt%- and 10 wt%-doped films exhibited extreme responses in the investigated doping range, where the former and the latter showed, respectively, highest and lowest conductivity as well as lowest and highest possibility of grain effects in the film structure. This behavior was confirmed using two different analysis techniques with two separate data sets, (Z, θ) and (C, G). © 2021, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature.
dc.description.sponsorshipThis work was supported by the Scientific and Technological Research Council of Turkey (TÜBİTAK) with Project No. 115M658.
dc.identifier.doi10.1007/s10854-021-05935-1
dc.identifier.eissn1573-482X
dc.identifier.endpage13609
dc.identifier.issn0957-4522
dc.identifier.issue10
dc.identifier.scopus2-s2.0-85104891352
dc.identifier.startpage13594
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/13185
dc.identifier.volume32
dc.identifier.wosWOS:000643186700010
dc.language.isoen
dc.publisherSpringer
dc.relation.ispartofJournal of Materials Science: Materials in Electronics
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectCrystallite size
dc.subjectII-VI semiconductors
dc.subjectMetallic films
dc.subjectOptical films
dc.subjectOxide films
dc.subjectOxide minerals
dc.subjectSemiconductor doping
dc.subjectTin metallography
dc.subjectTin oxides
dc.subjectTransparency
dc.subjectZinc oxide
dc.subjectZinc sulfide
dc.subjectAppropriate techniques
dc.subjectDifferent analysis techniques
dc.subjectElectrical characteristic
dc.subjectHexagonal wurtzite structure
dc.subjectOptical characterization
dc.subjectStructural characterization
dc.subjectSuccessive ionic layer adsorption and reactions
dc.subjectWide temperature ranges
dc.subjectThin films
dc.titleComplex electrical impedance and modulus characterizations of ZnO:Sn thin films in a wide temperature range
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus19
rdl.citation.wos18
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)