A comparative study of fatigue properties of TiVN and TiNbN thin films deposited on different substrates

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Transition metal nitrides, especially ternary phase films attract attention due to their high mechanical and tribological features. Besides these, fatigue properties play a very important role on the performance in service life of these types of films. TiVN and TiNbN films were deposited on M2 and H13 steel substrates by reactive magnetron sputtering system. Fatigue properties of the films were characterized via multipass scratch tests. 100, 250 and 500 cycles with bidirectional multipass scratch tests were conducted at room temperature by applying 20 N constant load. Structural properties were determined with X-ray diffraction, scanning electron microscopy and energy dispersive spectroscopy. Mechanical features of the films were observed with nano hardness tests. Fatigue behaviors, deformation types, coefficient of frictions of the films and effect of different substrates were discussed comparatively. According to the results, the TiVN films showed better fatigue resistance than the TiNbN films although critical adhesion load value of the TiNbN films was higher than the TiVN films. The TiVN films generally showed ductile type cracks at the edge of the tracks and the TiNbN films showed more brittle type cracks. Additionally, the films deposited on M2 substrates exhibited better strength than those of H13 substrates. © 2017 Elsevier B.V.

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AlanDeğerDil
dc.contributor.authorCicek, Hikmet
dc.contributor.authorBaran, Ozlem
dc.contributor.authorKeles, Aysenur
dc.contributor.authorTotik, Yasar
dc.contributor.authorEfeoglu, Ihsan
dc.date.accessioned2026-10-18T20:29:05.898781813Z
dc.date.available2026-10-18T20:29:05.898781813Z
dc.date.issued2017
dc.description.abstractTransition metal nitrides, especially ternary phase films attract attention due to their high mechanical and tribological features. Besides these, fatigue properties play a very important role on the performance in service life of these types of films. TiVN and TiNbN films were deposited on M2 and H13 steel substrates by reactive magnetron sputtering system. Fatigue properties of the films were characterized via multipass scratch tests. 100, 250 and 500 cycles with bidirectional multipass scratch tests were conducted at room temperature by applying 20 N constant load. Structural properties were determined with X-ray diffraction, scanning electron microscopy and energy dispersive spectroscopy. Mechanical features of the films were observed with nano hardness tests. Fatigue behaviors, deformation types, coefficient of frictions of the films and effect of different substrates were discussed comparatively. According to the results, the TiVN films showed better fatigue resistance than the TiNbN films although critical adhesion load value of the TiNbN films was higher than the TiVN films. The TiVN films generally showed ductile type cracks at the edge of the tracks and the TiNbN films showed more brittle type cracks. Additionally, the films deposited on M2 substrates exhibited better strength than those of H13 substrates. © 2017 Elsevier B.V.
dc.identifier.doi10.1016/j.surfcoat.2017.06.078
dc.identifier.endpage303
dc.identifier.issn0257-8972
dc.identifier.scopus2-s2.0-85029681219
dc.identifier.startpage296
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/14294
dc.identifier.volume332
dc.identifier.wosWOS:000418968100035
dc.language.isoen
dc.publisherElsevier B.V.
dc.relation.ispartofSurface and Coatings Technology
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectFatigue
dc.subjectMultipass scratch
dc.subjectTiNbN
dc.subjectTiVN
dc.subjectCracks
dc.subjectEnergy dispersive spectroscopy
dc.subjectFatigue of materials
dc.subjectScanning electron microscopy
dc.subjectTransition metals
dc.subjectX ray diffraction
dc.subjectCoefficient of frictions
dc.subjectComparative studies
dc.subjectDifferent substrates
dc.subjectMulti-pass
dc.subjectReactive magnetron sputtering
dc.subjectTransition metal nitrides
dc.subjectThin films
dc.titleA comparative study of fatigue properties of TiVN and TiNbN thin films deposited on different substrates
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus25
rdl.citation.wos22
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)
rdl.wos.indexConference Proceedings Citation Index - Science (CPCI-S)