Current–Voltage and Capacitance–Conductance–Voltage Characteristics of Al/SiO2/p-Si and Al/Methyl Green (MG)/p-Si Structures

ArticleAçık Erişim

Özet

The organic methyl green (MG) has been investigated for the first time for its electronic applications. In order to see the effect of organic MG layer on electrical characteristics of Al/p-Si diode, Al/MG/p-Si structure has been fabricated by inexpensive and simple “drop coating” method. The current–voltage (I–V) and capacitance–conductance–voltage (C–G–V) characteristics of Al/SiO2/p-Si and Al/MG/p-Si structures have been investigated. The parameters such as ideality factor (n), barrier height , series and shunt resistance, and the density of interface states have been investigated using current–voltage measurements, in dark and under illumination conditions at room temperature. The n and value of the Al/SiO2/p-Si structure at room temperature is larger than that of conventional Al/p-Si diode. It is seen that the n value of 1.36 calculated for the Al/MG/p-Si structure is lower than most of the metal/organic compound/inorganic semiconductor devices. © 2014, The Minerals, Metals and Materials Society and ASM International.

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RDL Kalıcı Bağlantı (PID)
https://rdlopen.rawdatalibrary.net/r/ebyu/15383Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1007/s11661-014-2621-6Yayıncı resmi DOI adresi
Tam Kayıt
AlanDeğerDil
dc.contributor.authorDuman, Songül
dc.contributor.authorOzcelik, Fikriye Seyma
dc.contributor.authorGürbulak, Bekir
dc.contributor.authorGülnahar, Murat
dc.contributor.authorTurut, Abdulmecit
dc.date.accessioned2026-10-18T20:30:12.289803460Z
dc.date.available2026-10-18T20:30:12.289803460Z
dc.date.issued2015
dc.description.abstractThe organic methyl green (MG) has been investigated for the first time for its electronic applications. In order to see the effect of organic MG layer on electrical characteristics of Al/p-Si diode, Al/MG/p-Si structure has been fabricated by inexpensive and simple “drop coating” method. The current–voltage (I–V) and capacitance–conductance–voltage (C–G–V) characteristics of Al/SiO2/p-Si and Al/MG/p-Si structures have been investigated. The parameters such as ideality factor (n), barrier height , series and shunt resistance, and the density of interface states have been investigated using current–voltage measurements, in dark and under illumination conditions at room temperature. The n and value of the Al/SiO2/p-Si structure at room temperature is larger than that of conventional Al/p-Si diode. It is seen that the n value of 1.36 calculated for the Al/MG/p-Si structure is lower than most of the metal/organic compound/inorganic semiconductor devices. © 2014, The Minerals, Metals and Materials Society and ASM International.
dc.identifier.doi10.1007/s11661-014-2621-6
dc.identifier.eissn1543-1940
dc.identifier.endpage353
dc.identifier.issn1073-5623
dc.identifier.issue1
dc.identifier.scopus2-s2.0-84925517926
dc.identifier.startpage347
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/ebyu/15383
dc.identifier.volume46
dc.identifier.wosWOS:000346788600040
dc.language.isoen
dc.publisherSpringer Boston
dc.relation.ispartofMetallurgical and Materials Transactions A: Physical Metallurgy and Materials Science
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectAluminum coatings
dc.subjectInterface states
dc.subjectSemiconductor device structures
dc.subjectSemiconductor diodes
dc.subjectSilicon
dc.subjectBarrier heights
dc.subjectDensity of interface state
dc.subjectElectrical characteristic
dc.subjectElectronic application
dc.subjectIdeality factors
dc.subjectIllumination conditions
dc.subjectSeries and shunt resistances
dc.subjectVoltage characteristics
dc.subjectCapacitance
dc.titleCurrent–Voltage and Capacitance–Conductance–Voltage Characteristics of Al/SiO2/p-Si and Al/Methyl Green (MG)/p-Si Structures
dc.typeArticle
dspace.entity.typePublication
rdl.citation.scopus13
rdl.citation.wos11
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)